Silicon Wafer Processing
FO PDF Print E-mail

In producing these semiconductor devices, the surface of the semiconductor wafer, most typically silicon, or a compound semiconductor, must be precisely lapped. The most suitable material to process the surface of semiconductor elements is the product harvested from Fujimi's technology: the precision lapping powder FO.

FO is an alumina-based precision lapping powder, made using carefully selected materials, and undergoing Fujimi's own unique processing to produce a powder with special particle shape and hardness. Produced under the strictest quality control, FO provides constant, stable lapping capability, with no scratching on the surface of the material being lapped. This being the case, not only is FO effective with semiconductor wafers, but it also possesses superior capabilities in the processing of lenses, prisms, and other glassware used for optical applications. Thus, FO can be used with complete confidence, for high value-added workpieces.




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Glanzox PDF Print E-mail

With the increasing integration of semiconductor devices and the larger size of wafers, a silicon surface that is free of damage, haze and heavy metal contamination, as well as flat, and nanotopographically mirror-like is essential. 

Fujimi's GLANZOX series was developed to meet such requirements. GLANZOX polish consists of colloidal silica dispersed in a liquid composed of special ingredients. This product results in an almost perfectly polished surface. In response to the recent demand for considerable reductions in the metal impurities that affect device characteristics, higher grades of polish containing ultrapure colloidal silica have been developed.

Compol PDF Print E-mail

COMPOL is a colloidal silica developed especially for polishing metals, ceramics and electronic substrates LiTaO3, LiNbO3 and sapphire.With excellent particle uniformity and dispersal it delivers high removal rate damage free polishing even when used at high dilutions.  Compol delivers excellent process efficiency and long slurry life.

A, WA & PWA PDF Print E-mail


A is the most widely known abrasive powder, popularly called alundum. This product is made by melting bauxite in an electric furnace at a temperature of 2000℃ to obtain aluminumoxide (Al2O3) corundum crystal of at least 90% purity. One special feature of this product is that the toughness (tenacity) of the abrasive particles has been increased by fusing them with a small percentage of titanium. As a result, A has the highest degree of toughness among all Fujimi abrasive powders.

This product, which is manufactured to sustain a consistent distribution of particle sizes, is a highly efficient abrasive and will not scratch the surface of the workpiece, and maintains great stability as it functions as an abrasive. A is well suited for use as a material in super-finishing precision grindstones and super-finishing lapping cloth or paper. It is the most suitable abrasive powder for use on cathode-ray tubes and related glassware, and soft metals, where precision lapping is required.

GC & C PDF Print E-mail


GC, green silicon carbide, is a very high purity SiC lapping powder. The hexagonal α-type crystal is just below diamond in terms of hardness, and its chemical stability is excellent at room temperature. The result is a product with superior lapping and polishing capabilities, which is not affected by chemicals, and can spontaneously generate sharp grinding edges through fragmentation.

GC is well suited for use as a lapping powder in a wide range of functions, including the precision lapping and dicing of crystal and ferrite, the slicing of Si ingots, and the processing of materials ranging from ultra- hard metals and edged tools to soft metals such as brass and other copper alloys. Additionally, GC is used in the processing of various resins. GC is also ideal for use in super-finishing precision grindstones. As it possesses the electricalproperties of a semiconductor, GC has good heat conductivity and has the ability to withstand high temperatures, making it useful as a material in fine ceramics.

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