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Polishing

With the increasing integration of semiconductor devices and the larger size of wafers, a silicon surface that is free of damage, haze and heavy metal contamination, as well as flat, and nanotopographically mirror-like is essential. 

Fujimi's GLANZOX series was developed to meet such requirements. GLANZOX polish consists of colloidal silica dispersed in a liquid composed of special ingredients. This product results in an almost perfectly polished surface. In response to the recent demand for considerable reductions in the metal impurities that affect device characteristics, higher grades of polish containing ultrapure colloidal silica have been developed.


Download the Data Sheet (221kb)


 
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