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Polishing
Glanzox PDF Print E-mail
Polishing

With the increasing integration of semiconductor devices and the larger size of wafers, a silicon surface that is free of damage, haze and heavy metal contamination, as well as flat, and nanotopographically mirror-like is essential. 

Fujimi's GLANZOX series was developed to meet such requirements. GLANZOX polish consists of colloidal silica dispersed in a liquid composed of special ingredients. This product results in an almost perfectly polished surface. In response to the recent demand for considerable reductions in the metal impurities that affect device characteristics, higher grades of polish containing ultrapure colloidal silica have been developed.

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Compol PDF Print E-mail
Polishing

COMPOL is a colloidal silica developed especially for polishing metals, ceramics and electronic substrates LiTaO3, LiNbO3 and sapphire.With excellent particle uniformity and dispersal it delivers high removal rate damage free polishing even when used at high dilutions.  Compol delivers excellent process efficiency and long slurry life.


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Polipla PDF Print E-mail
Polishing

Fujimi POLIPLA is a compound-type polishing slurry developed specifically for polishing lenses made from plastics such as CR-39 and Polycarbonate. The high purity alumina is uniformly dispersed in a specially developed solution with a pH in the range of 3.0 to 4.0, the formulation delivers excellent polishing performance and a high quality finished surface.  It is available in a wide range of formulations to meet the requirements of many applications and process flows, please contact us for updated information of the optimal solution for your process needs.

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Clealite PDF Print E-mail
Polishing

CLEALITE is a polishing slurry for all kinds of metals, including aluminum. stainless steel and titanium to produce mirror finish. The 2340 type has special additives that delivers scratch free surface with surface roughness of 10nm (Rmax). The S type is based on colloidal silica slurry balanced with special additives to control selective processing. and has been specifically developed as final polishing slurry for metals. The polishing method and conditions are same for both 2340 type and S type. but S type provides higher removal rate and better surface performance.


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Surfin Polishing Pads PDF Print E-mail
Polishing

SURFIN polishing pads are used for precision polishing of silicon wafers and semiconductor crystals, metals and glasses. Building on its expertise and research in abrasive materials and knowledge of raw materials as well as technology to control particles, Fujimi has expanded its capabilities to offer such products as insulation coatings for electron guns and catalyst carriers for pollution control.


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Insec PDF Print E-mail
Polishing

The INSEC series is a range of polishing agents for high-precision mirror-finishing of a compound semiconductor crystal through the mechanochemical process.


This series has a wide variety of products, including: FP (first-stage polishing agent); NIB (final polishing agent) for gallium arsenide (GaAs) wafers; P (final polishing agent) for gallium phosphide (GaP) wafers; SP, an agent used exclusively for double-sided polishing of GaAs wafers, and IPP, which is an agent used for first polishing of indium phosphide (InP) wafers.


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FZ PDF Print E-mail
Polishing

FZ-05 and FZ-02 are composed of ultra-fine zirconium oxide particles. and aloe optimum for polishing special metals such as molybdenum. tangsten. chromium. titanium and nickel. and their alloys. When FZ is used with a hard urethane pad and polishing pitch. it provides the deep. scratch free luster unique to metals. FZ-02 can also be used for final polishing of optical lenses for scrtach free. bump free lens. and clear interference image free of waves.


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